Matching Improvement of RF Matcher for Plasma Etcher

Matcher Composition Methods for Automatic Schema Matching

We address the problem of automating the process of deciding whether two data schema elements match (that is, refer to the same actual object or concept), and propose several methods for combining evidence computed by multiple basic matchers. One class of methods uses Bayesian networks to account for the conditional dependency between the similarity values produced by individual matchers that u...

application of upfc based on svpwm for power quality improvement

در سالهای اخیر،اختلالات کیفیت توان مهمترین موضوع می باشد که محققان زیادی را برای پیدا کردن راه حلی برای حل آن علاقه مند ساخته است.امروزه کیفیت توان در سیستم قدرت برای مراکز صنعتی،تجاری وکاربردهای بیمارستانی مسئله مهمی می باشد.مشکل ولتاژمثل شرایط افت ولتاژواضافه جریان ناشی از اتصال کوتاه مدار یا وقوع خطا در سیستم بیشتر مورد توجه می باشد. برای مطالعه افت ولتاژ واضافه جریان،محققان زیادی کار کرده ...

A UHF-ECR Plasma Etcher for Insulation Films

OVERVIEW: In the rapid evolution of VLSI technology toward smaller geometries and increased levels of chip integration, minimum features of 0.18 μm are already being mass produced, and feature sizes of 0.13 μm are being developed. At the same time, 300-mm fab lines are being built, and this is driving a demand for new etching technologies that support smaller tolerances and larger wafer sizes. ...

Bayesian Networks for Matcher Composition in Automatic Schema Matching

We propose a method for accurate combining of evidence supplied by multiple individual matchers regarding whether two data schema elements match (refer to the same object or concept), or not, in the field of automatic schema matching. The method uses a Bayesian network to model correctly the statistical correlations between the similarity values produced by individual matchers that use the same...

An Automatic Real Time Impedance Matching System for Use in an RF Electrostatics Accelerator Ion Source